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Positive Resist Developer, 475ml (418-500ML)

SKU 418-500ML
Manufacturer: MG Chemicals
  • For removing exposed resist during the positive photofabrication process. Disolves exposed photoresist. Concentrated formulation - dilute one part developer to ten parts water.
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Original price $19.08 - Original price $19.08
Original price
$19.08 - $19.08
Current price $19.08
In stock
Stock: 2+ QTY

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