Positive Resist Developer, 475ml (418-500ML)
SKU 418-500ML
Manufacturer: MG Chemicals
- For removing exposed resist during the positive photofabrication process. Disolves exposed photoresist. Concentrated formulation - dilute one part developer to ten parts water.
Original price
$19.08
-
Original price
$19.08
Original price
$19.08
$19.08
-
$19.08
Current price
$19.08
Availability:
In stock
Stock:
2+ QTY
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